Japanese photoresist giants JSR, Tokyo Ohka, Shin-Etsu raise prices 15-22% from Oct 2026
Japan's three major photoresist manufacturers—JSR, Tokyo Ohka Kogyo, and Shin-Etsu Chemical—announced a global price increase effective October 1, 2026, with base hikes of 15% across all products and 16-22% for high-end ArF series long-term contracts. Chinese wafer foundries report limited impact, as photoresist accounts for about 1% of costs and many have not received formal notices. The price hike is accelerating domestic substitution, with verification cycles shortening from 1-2 years to 6-12 months, though current localization rates remain low (KrF ~10%, ArF ~5%).
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Overseas Photoresist Price Hikes Accelerate China's Domestic Substitution Verification Cycle
According to media reports, following a joint announcement by Japan's three major photoresist giants—JSR, Tokyo Ohka Kogyo, and Shin-Etsu Chemical—to raise prices globally from October 1, 2026, by 15% for all new orders and 16%-22% for high-end ArF series long-term contracts, a photoresist company executive stated that a notable change is the significant acceleration of domestic substitution. Downstream wafer foundries have substantially increased testing opportunities, shortening the basic verification cycle from the previous 1-2 years to 6-12 months. In the secondary market, the semiconductor materials sector saw notable movement, with photoresist-related listed companies attracting concentrated capital attention. From September 16 to September 24, the photoresist concept stock index rose from 2524.28 points to a high of 2601.90 points, a maximum gain of 3.08%, before closing at 2552.74 points on September 24, down 1.89%, indicating a short-term pullback.
Read sourceJapanese photoresist giants to raise prices; impact on Chinese chipmakers seen as limited
Japanese photoresist giants JSR, Tokyo Ohka Kogyo, and Shin-Etsu Chemical jointly announced a new global pricing system effective October 1, 2026, with base price increases of 15% across all product categories and 16%-22% for high-end ArF series long-term contracts. The article, based on interviews with Chinese wafer foundries including Hua Hong Grace, Silan Microelectronics, and Nexchip, and domestic photoresist firms such as DIC Corporation, Nata Opto-electronic, and Crystal Clear Electronic Material, reports that the actual impact on Chinese chipmakers is limited. Photoresist accounts for only about 1% of total costs for foundries like Silan Microelectronics, and many firms have not yet received formal price adjustment notices. The article highlights that the price hike is accelerating a window for domestic Chinese photoresist companies to replace Japanese imports, though current localization rates remain low (KrF ~10%, ArF ~5%). Industry sources note that downstream verification cycles have shortened from 1-2 years to 6-12 months, and several domestic firms are ramping up production and customer validation.
Read sourceJapanese Photoresist Giants to Raise Prices 15-22% from Oct 2026; Limited Impact on Chinese Fabs
Japanese photoresist giants JSR, Tokyo Ohka Kogyo, and Shin-Etsu Chemical have jointly announced a new pricing system effective October 1, 2026, with base price increases of 15% across all product categories and 16-22% for high-end ArF series long-term contracts. According to a survey by 科创板日报 (via Tencent Stock), the impact on Chinese wafer fabs is expected to be limited. Huali Hongli, Silan Micro, and other major fabs reported not receiving formal notices and noted that photoresist accounts for only about 1% of total costs. The article highlights that the price hike is accelerating domestic substitution, with Chinese photoresist makers like Tongcheng New Materials, Dinglong, and Nanda Optoelectronics seeing faster verification cycles (shortened from 1-2 years to 6-12 months) and increasing orders. However, industry insiders caution that domestic photoresist still faces challenges in achieving full technical equivalence and stable mass production, with current localization rates at only ~10% for KrF and ~5% for ArF photoresists.
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Japanese Photoresist Giants' Price Hike Has Limited Impact on Chinese Chipmakers, Report Says
Japanese photoresist giants JSR, Tokyo Ohka Kogyo, and Shin-Etsu Chemical announced a joint price increase effective October 1, 2026, with base hikes of 15% and up to 16-22% for high-end ArF series long-term contracts. A report by China's Star Market Daily, based on interviews with major Chinese wafer fabs including Hua Hong Grace, Silan Micro, and Nexchip, as well as domestic photoresist producers, concludes the actual impact on Chinese manufacturers is limited. Wafer fabs note that photoresist costs are a tiny fraction of total expenses (around 1% for some), and they maintain diversified supply chains and safety stocks. The price hike is seen as accelerating opportunities for domestic photoresist companies like Dintech, Red Avenue New Materials, and Crystal Clear Electronic Material to increase market share, though overall domestic substitution rates remain low (KrF ~10%, ArF ~5%). Industry sources emphasize that product stability and performance, not price, are the primary criteria for adoption by Chinese fabs.
Japanese Photoresist Giants Announce 15% Price Hike; Chinese Firms See Limited Impact, Accelerated Localization
Japanese photoresist giants JSR, Tokyo Ohka Kogyo, and Shin-Etsu Chemical have jointly announced a new global pricing system effective October 1, 2026, with base price increases of 15% across all product categories and 16%-22% for high-end ArF series long-term contracts. The article, based on interviews by 财联社 with major Chinese wafer foundries (Hua Hong, Silan Micro, CR Micro, Nexchip) and domestic photoresist producers (Dinglong, TSRC, Nata Optoelectronics, Crystal-Radical, Jiuri), reports that the actual impact on Chinese manufacturers is limited. Foundries note photoresist costs are a very small percentage of total costs (around 1% for some), and they maintain diversified supply chains and safety stocks. The price hike is seen as accelerating the window for domestic photoresist substitution. Domestic firms like Dinglong and TSRC report increased validation opportunities from foundries, with verification cycles shortening from 1-2 years to 6-12 months. However, the article notes that current domestic ArF photoresist localization rate is only about 5%, and full-scale substitution faces hurdles including product equivalence, stable mass production, and foundry trust in long-term stability.
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